CVD-SiC (Chemical Vapor Deposition) "Film Single Component Manufacturing Technology"
Numerous achievements in a harsh environment! Versatile membrane manufacturing technology that can adapt widely.
We provide products composed solely of dense SiC films by applying coating technology. Our solutions can be widely adapted, from flat plates to complex shapes. We have numerous achievements in harsh environments, including ultra-high temperatures and plasma, primarily in semiconductor manufacturing equipment. 【Manufacturing Process (Example)】 1. Machining graphite substrate into a disc shape 2. CVD-SiC coating applied to the entire surface 3. Exposing the substrate through outer circumference processing 4. Removing the substrate in a high-temperature oxidation atmosphere 5. Resulting in two single-layer film discs 6. Grinding/polishing, chamfering, cleaning, and inspection For more details, please contact us or download the catalog.
- Company：フェローテックホールディングス
- Price：Other
